EN
ISC150 Sputter Coater
Metals that can be deposited: Au, Pt, Pd, Ir, etc.
1Magnetron sputtering cathode technology: Fine coating without thermal damage
2 Large chamber (diameter 150mm), constant pressure sputtering
3 Digital rotary-tilting sample stage: 3D sample deposition
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Product Introduction

Field emission scanning electron microscopy (FE-SEM) has higher resolution compared to filament electron microscopy, with magnifications reaching up to the order of 100,000x. This places higher demands on the particle size of the sputtering instrument for gold deposition. Not only is it required that the particles be fine and not cover the sample surface, but there should also be gains in charge elimination and contrast enhancement.

The standard approach for sample preparation in FE-SEM is sputter-coating with Pt metal, as the particle size of Pt is only 2-3 nm. The small particle size is advantageous for presenting a more realistic morphology of the sample. The ISC150 ion sputtering instrument can be equipped with a Pt target for sputter-coating samples for FE-SEM, which helps alleviate charging without masking the true morphology of the sample.

Product Specification

Technical Specifications

parameters

Vacuum Pump

Rotary Vane Pump

Pumping  Speed

≥4m3/h

Ultimate Vacuum

<1Pa

Working  Pressure

4-10Pa(Constant Pressure Control )

Pumping  Time

<3-5Min

Vacuum Gauge

Pirani Vacuum Gauge

Chamber

Ø150*120mm Scratch-resistant Quartz Glass

Sputtering Target

Ø50*0.1-1mm

Sputtering Power

Constant Power Magnetron Sputtering DC Power Supply ( Max.20W, Max.100 mA, 0-800V DC )

Operation Mode

Touchscreen Control with the Control System Providing Interlock Protection Functions

Weight

~20kg

Dimension

~400mm*337mm*346mm

Power Supply

100-220V AC, 50/60Hz Grounding Triangle Plug

Power Consumption

<500W

Warranty

One Year

Application Cases
Algae (Pt Coating)
Lithium precursor powder (Pt coating)