Ultra-high-resolution field emission SEM can achieve magnifications in the range of 200K to 300K times, thus demanding finer granularity in metal coating.
Standard Pt or Pt-Pd alloy solutions can no longer meet these requirements well. Higher melting point Ir targets are too expensive, so high melting point metals with smaller particles like W and Cr are favored. However, due to their reactive chemical properties, W and Cr require higher vacuum levels for coating.
The ISC150T is a high-vacuum ion sputter coater that utilizes a combination of a diaphragm pump and a turbomolecular pump, capable of generating a high vacuum in the range of 10-3 Pa. It can sputter noble metal targets such as Au, Pt, or Pd, as well as easily oxidizable targets such as W, Cr, and C. It is particularly suitable for high-resolution, high-magnification field emission SEM sample preparation.
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Technical Specifications |
Parameters |
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Vacuum Pump System |
Oil-free Diaphragm Pump and Turbo Pump |
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Pumping Speed |
>0.7m3/h ( Diaphragm pump ) + 60 L/S ( Turbo pump ) |
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Ultimate Vaccum |
<1E-3 Pa |
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Working Pressure |
0.3-1Pa |
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Vacuum Gauge |
Pirani Vacuum Gauge |
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Gas Control |
MFC（50 SCCM Ar） |
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Chamber |
Ø150 *120mm Scratch-resistant Quartz Glass |
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Sputtering Target |
Target Dimension Ø 50*0.1-2mm ( Recommended Thickness ≥0.2mm ) Capable of Sputtering Noble Metals like Au, Pt, Pd, as well as Common Materials like Cr, W, C. |
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Sputtering Power |
Constant Power Magnetron Sputtering DC Power Supply ( Max.30W, Max.100 mA, 0-800V DC ) |
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Gas Inlet |
Ø8mm Gas Pipe |
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Operation Mode |
Touchscreen Control with the Control System Providing Interlock Protection Functions |
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Weight |
~30 Kg |
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Dimension |
480mm*385mm*447mm |
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Power Supply |
100-220V AC, 50/60Hz Grounded Three-prong Plug |
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Power Consumption |
<500 W |
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Warranty |
One Year |
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