EN
RPS50EM Remote Plasma Source
Electron microscope chamber cleaning / Routine cleaning of the pre-evacuation chamber
1ICP-RF technology, gentler plasma
2 Low thermal damage, low plasma bombardment damage
3 Fully automatic touch screen control, easy to operate
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Product Introduction

The RPS50EM is a remote plasma cleaning source that can be integrated into SEM or FIB chambers. It efficiently cleans hydrocarbon contaminants from the chamber and samples by generating plasma through gas ionization. This not only resolves the carbon deposition black frame phenomenon during imaging but also improves imaging resolution and contrast, and shortens the chamber evacuation time.

RF-ICP technology makes the plasma gentler, significantly reducing thermal damage and plasma bombardment damage during the cleaning process.

Product Specification

Technical Specifications

Parameters

Working Pressure

0.5-40Pa

RF power supply

13.56 MHz RF power supply, RF power adjustable from 10 to 50 W

Gas Module

Standard MFC 100 sccm flow meter (N2) / 1 unit

Operation Mode

Touchscreen Control with the Control System Providing Interlock Protection Functions. It Provides Serial Control Commands for Further Development and Programming

Dimension

250mm*350mm*110 mm（Controller）

178.5mm*138.5mm*99.5mm（RF Ion Source）

Weight

~9kg

Connection Method

KF40 Flange Interface

Gas Inlet

Ø6mm Gas Pipe

Power Supply

100-220V AC, 50/60Hz Grounded Three-prong Plug

Power Consumption

＜200 W

Warranty

One Year